发明人： 李艳秋，黄炜晨，刘克

申请人： 北京理工大学

申请号： 202410313581.8

申请日期： 2024.03.19

摘要： 本发明提出了一种应用于曲线掩膜的优化方法，该方法通过将二维掩膜图案的边缘信息转换为一维质心角函数，实现了在不降低光刻胶中成像图案保真度的情况下，有效的减少了存储的数据量；并且，采样对质心角函数进行采样的方法能给有效的降低设定边缘控制点算法的复杂程度并有效的增加了选取流程的合理性和简洁性，同时，利用质 ...

发明人： 李艳秋，杨贺，刘克

申请人： 北京理工大学

申请号： 202410811998.7

申请日期： 2024.06.21

摘要： 本发明提供一种应用于光刻的曲型掩模优化方法，能够降低参数化曲型掩模优化工艺的计算复杂度和曲型掩模的数据量。该方法具体过程为：初始化掩模图形，采用等间隔轮廓采样获取初始掩模控制顶点坐标矩阵D；依据目标函数迭代更新掩模控制点坐标D，优化曲型掩模结构；利用节点消去算法去除掩模图形中包含的冗余控制顶点，更新 ...

作者： 张新新^1,2;，宁天磊^1,2;，刘丽辉^1,2;，李艳秋^1,2; （¹北京理工大学光电学院；²北京理工大学光电成像技术与系统教育部重点实验室）

出处： 光学学报 2024 第44卷 第16期 P171-178

关键词： 测量；空间调制；弱光场；Stokes矢量；波片快轴角；偏振检测

摘要： 空间调制偏振仪中光子空间分布特征与偏振信息的映射关系对检测的准确性有直接影响，而该映射关系由光学元件的Mueller矩阵决定。系统分析了波片快轴角度对空间调制偏振测量精度的影响，采取仪器矩阵条件数优化的方法确定最佳波片快轴角度，进一步从仿真和实验两个方面进行验证，结果表明，波片快轴设置为水平状态时检 ...

作者： Wu, Jinxian¹;Ma, Xiang²;Liu, Jiaming²;Lai, Chunquan²;Li, Yanqiu¹ （¹Beijing Inst Technol, Sch Optoelect, 5 South Zhongguancun St, Beijing 100081, Peoples R China.;²Beijing Inst Technol, Sch Med Technol, 5 South Zhongguancun St, Beijing 100081, Peoples R China.）

出处： OPTICS LETTERS 2024 Vol.49 No.12 P3464-3467

关键词： 2ND-HARMONIC GENERATION

摘要： Existing polarimetry, mainly focusing on harmonic generations, overlooks the differences in retardance (DRs) caused by illuminations with different wa ...

作者： Yuzhen Wu¹;Lingxue Wang^1,2;CA1;Lian Zhang¹;Xudong Han¹;Dezhi Zheng^1,2;Shuigen Wang³;Yanqiu Li¹;Yi Cai^1,2; （¹MIIT Key Laboratory of Complex-Field Intelligent Exploration, School of Optics and Photonics, Beijing Institute of Technology, 5 Zhongguancun South Street, Beijing, 100081, China;²Beijing Institute of Technology, Zhuhai, No. 6 Jinfeng Road, Tangjiawan, Zhuhai, 519088, China;³Yantai IRay Technologies Lt. Co., 11 Guiyang Street, Yantai, 265501, China）

出处： ISPRS Journal of Photogrammetry and Remote Sensing 2024 Vol.216 P45-65

摘要： This paper presents a catadioptric omnidirectional thermal odometry (COTO) system that estimates the six degrees of freedom (DoF) pose of a camera usi ...

作者： Zhang, Xiaotian¹;Han, Xiting¹;Wang, Tao¹;Zhong, Hui¹;Liu, Shuhao¹;Li, Yanqiu¹;Liu, Ke¹ （¹Beijing Inst Technol, Sch Opt & Photon, Key Lab Photoelect Imaging Technol & Syst, Minist Educ China, Beijing 100081, Peoples R China.）

出处： APPLIED OPTICS 2024 Vol.63 No.9 P2331-2339

摘要： A new method, to the best of our knowledge, based on double-slit (DS) interference is proposed to accurately estimate the shear ratio of the system, w ...

作者： Ma, Xiang^{1, 2}; Wu, Jinxian¹; Hu, Yujie¹; Li, Yanqiu^{1, 2} （¹Key Laboratory of Photoelectronic Imaging Technology, System of Ministry of Education of China, School of Optics and Photonics, Beijing Institute of Technology, 5 South Zhongguancun Street, Beijing; 100081, China;²Institute of Engineering Medicine, Beijing Institute of Technology, 5 South Zhongguancun Street, Beijing; 100081, China）

出处： Applied Optics 2024 Vol.63 No.13 P3381-3389

作者： Yue, Liwan^1,2;Mao, Zhibiao²;Wu, Qiang³;Li, Yanli³;Li, Yanqiu¹ （¹Beijing Inst Technol, Sch Opt & Photon, Beijing 100081, Peoples R China.;²Ningbo Nata Optoelect Mat Co Ltd, 21 Qingshan Rd, Ningbo 315800, Zhejiang, Peoples R China.;³Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R China.）

出处： AIP ADVANCES 2024 Vol.14 No.2

摘要： Since the logic 28 nm technology and beyond, ArF immersion lithography has been widely used in manufacturing. To fully utilize the potential of the li ...

作者： Chen, Guoqiang¹; Wang, Wen'ai^{1, 2}; Li, Yanqiu^{1, 2} （¹Key Laboratory of Photoelectronic Imaging Technology, System of Ministry of Education of China, School of Optics and Photonics, Beijing Institute of Technology, 5 South Zhongguancun Street, Beijing; 100081, China;²Institute of Engineering Medicine, Beijing Institute of Technology, 5 South Zhongguancun Street, Beijing; 100081, China）

出处： Applied Optics 2024 Vol.63 No.11 P2822-2830

作者： Zhang, Xinxin^1,2;Ning, Tianlei^1,2;Liu, Lihui^1,2;Li, Yanqiu^1,2 （¹Beijing Inst Technol, Sch Opt & Photon, Beijing 100081, Peoples R China.;²Beijing Inst Technol, Minist Educ, Key Lab Photoelect Imaging Technol & Syst, Beijing 100081, Peoples R China.）

出处： ACTA OPTICA SINICA 2024 Vol.44 No.16

关键词： POLARIMETER

摘要： Objective Polarimeters, as powerful tools for characterizing the polarization characteristics of light and various samples, have important application ...